Nordson Electronics Solutions – Vacuum Plasma Treatment Systems – AP Series

  • CHINA

    Damien Teo, General Manager, Semiconductor & Electronics, DKSH Technology China

    DKSH (Shanghai) Ltd.
    Unit 502, No.13 Xin’an Building, 99 Tianzhou Road
    200233 Shanghai
    China

    +86 21 6482 3806

    +86 21 3367 8466

    Email

  • MALAYSIA

    Tay Tun Yong, Technical Sales & Services Manager

    DKSH Technology Sdn. Bhd.
    No. 108-B-01-08, Setia Spice Canopy, Jalan Tun Dr. Awang,
    11900 Bayan Lepas, Penang
    Malaysia

    +60 4 645 2672

    Email

  • SINGAPORE

    Monica Wan, General Manager

    DKSH Singapore Pte Ltd
    625 Lorong 4 Toa Payoh, #03-00
    319519 Singapore
    Singapore

    +65 6962 3121

    +65 6273 1503

    Email

  • THAILAND

    Lau Chek Chung, General Manager, Semiconductor & Electronics, Malaysia, Thailand and Vietnam

    DKSH (Thailand) Limited
    2106 Fantree 4 Building, Sukhumvit Road,
    Phrakhanong-Tai, Phrakhanong 10260 Bangkok
    Thailand

    +66 2 639 7000

    Email

  • VIETNAM

    Ly Thi Bich Duyen (Bella), Senior Supervisor

    DKSH Technology Co.,Ltd
    5th Floor, Viettel Complex, 285 Cach Mang Thang Tam Ward 12, District 10
    70000 Ho Chi Minh City
    Vietnam

    +84 8 38125806

    Email

  • VIETNAM

    Nguyen Phan Loan Anh, Assistant Sales Manager

    DKSH Technology Co.,Ltd
    5th Floor, Viettel Complex, 285 Cach Mang Thang Tam Ward 12, District 10
    70000 Ho Chi Minh City
    Vietnam

    +84 8 38125806

    Email

  • AP-300 Plasma System Brochure


  • AP-600 Plasma System Brochure


  • AP-1000 Plasma System Brochure


  • AP-1500 Plasma System Brochure


AP series plasma treatment machines are suitable for a wide variety of plasma cleaning, surface activation and adhesion improvement applications. These capabilities are used for semiconductor manufacturing, microelectronic packaging and assembly, and by manufacturers of medical and life science devices. The AP Series consists of four batch plasma treatment systems offering small, mid-size and large vacuum chamber options that deliver process correlation, controller continuity and reliable, reproducible vacuum gas plasma treatment to customers as they expand from an R&D environment to various levels of production.

Key Features

  • PLC controller with touch screen provides an intuitive graphical interface and real time process representation
  • Flexible shelf architecture allows processing of a wide variety of part carriers in either direct or downstream plasma mode
  • 13.56 MHz RF generator has automatic impedance matching for unparalleled process reproducibility
  • Proprietary software control system generates process and production data for statistical process control
  • Batch style, each unit is completely self-contained, requiring minimal floor space
  • The pump, chamber, control electronics, and 13.56 MHz RF generator are housed in a single enclosure

Technical Specifications

AP 300AP 600AP 1000AP 1500
W x D x H – Footprint569W x 869D x 704H mm (22W x 34D x 28H in.)569W x 869D x 704H mm (22W x 34D x 28H in.)880W x 1127D x 1880H
(28.77W x62.3D x74.4H in.)
1118W x 1196D x 2407H mm
(44W x 47D x 95H in.)
Net Weight221 kg (487 lbs)221 kg (487 lbs)485 kg (1088 Ibs)921 kg (2030 Ibs)
Maximum Volume33.1 liters (2023 in³)50.4 liters (3076 in³)Right, Left – 153 mm (6 in.), Front – 880 mm (27 in.)
Back – 483 mm (19 in.) min.
127 liters
442.4 liters (27.000 in3)
Variable Electrode ConfigurationsPower-Ground, Ground-Power, Power-PowerPower-Ground, Ground-Power, Power-PowerPower-Ground, Ground-Power, Power-PowerPower-Ground, Ground-Power, Power-Power
Number of Electrode Positions771414
Electrode Pitch25.4 mm (1 in.)25.4 mm (1 in.) for 80D W
50.8 mm (2 in.) for 100o W
25.4 mm (1 in.) for 80D W
50.8 mm (2 in.) for 100o W
50.8 mm (2 in.)
Powered Working Area190W x 330D mm (7.5W x 13D in.)349W x 425D (13.74W x 18.73D in.)
384W x 425D mm (15.12W x 18.73D in.)
349W x 425D (13.74W x 18.73D in.)
384W x 425D mm (15.12W x 18.73D in.)
843W x841D mm (25.3W x25.2D in.)
Standard Wattage300 W600W600W2000 W
Available Flow Volumes10, 25, 50, 100, 250 or 500 sccm10, 25, 50, 100, 250 or 500 sccm10, 25, 50, 100, 250, 500, 10D0, 2000 or 5000 sccm10, 25, 50, 100, 250, 500, 1000, 2000 or 5000 socm
For further details, please refer to enclosed brochure.

Available Models

The AP-300 and AP-600 plasma treatment machines are benchtop-style, completely self-contained, requiring minimal bench space. The system chassis houses the plasma chamber, control electronics, 13.56 MHz RF generator, and the automatic matching network (only the vacuum pump is external to the system). Maintenance access is provided through an interlocked door or removable panels. The plasma chamber supports up to 7 removable and adjustable powered or grounded shelves to accommodate a wide range of piece-parts, components, and part carriers including magazines, trays, and boats. The vacuum plasma treatment systems can accommodate a wide range of process gases including argon, oxygen, hydrogen, helium, and fluorinated gases. Both models come standard with two (2) electronic mass flow controllers for optimal gas control, with another two (2) available optionally (4 total max.). Convenient facility hook-ups for periodic calibration requirements used in validation processes.

The AP-1000 platform allows full, front access allows for convenient access to all interior components. The pump is positioned on rollers for easy removal. The plasma chamber is constructed of 11-gauge stainless steel with aluminum fixtures for superior durability. The chamber has multiple removable and adjustable shelves to accommodate a range of part carriers, including magazines, trays, wafer and Auer boats. The AP-1000 Plasma Treatment System with optional HTP (high throughput) shelves combines the reliability and process quality of the AP-1000 system with the proven benefits of Nordson MARCH’s unique shelf design. The AP-1000 HTP optimizes use of the reactive ions found in RF plasma, increasing treatment uniformity while decreasing process time. The AP-1000 HTP system allows selection from a range of process gases such as Argon, Hydrogen and Helium. It comes standard equipped with four mass flow controllers for optimal gas control. Slotted magazines are placed vertically inside the chamber.

Additionally, slotted magazines can be placed vertically inside the chamber. Typically, each magazine holds a minimum of 20 lead frames. The AP-1000 plasma chamber can hold up to 12 magazines, depending on magazine size.

The AP-1500 plasma system is an effective plasma treatment with an extra-large chamber for batch processing. It is a cost- and space-efficient vacuum plasma treatment machine for treating all types of parts and components. It is completely self-contained, and requires minimal floor space. The pump, chamber, control electronics, and 40 MHz RF generator are all contained within its enclosure. The AP-1500 Plasma Treatment Equipment also offers slide-out horizontal shelves for ease of loading and unloading. Its compact and service-friendly design features a small footprint, and is designed for maintenance access from only the front and rear of the system. Therefore, multiple vacuum plasma treatment systems can be placed side-by-side to maximize floor space utilization. The pump is positioned on rollers for easy removal. The control system can be password-protected at multiple levels to prevent unauthorized recipe modification. This ensures consistent performance of the system from the first batch to the last.

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